Advanced Capacitor Dielectrics
Nanohmics is developing a flexible high breakdown strength dielectric for high volumetric energy density wound capacitors. Nanohmics previously evaluated amorphous SiO2, HfO2, TiO2 and ZrO2 as high strength dielectric films. Amorphous SiO2 was found to possess the right combination of breakdown strength, dielectric constant, ease of manufacture and flexibility. During the Phase II program, Nanohmics is scaling the sputtered deposition onto a load-locked roll-to-roll web coater to construct wound capacitors using amorphous SiO2 films as the dielectric.